Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-3927|36|8|762-767

ISSN： 1022-1336

Source： MACROMOLECULAR RAPID COMMUNICATIONS, Vol.36, Iss.8, 2015-04, pp. : 762-767

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