Surface reaction probabilities of radicals correlated from film thickness contours in silane chemical vapor deposition

By Tsai D.-S.   Chang T.-C.   Hsin W.-C.   Hamamura H.   Shimogaki Y.  

Thin Solid Films, Vol. 411, Iss. 2, 2002-05 ,pp. : 177-184

Elsevier

Access to resources Recommend Favorite

Catalyst patterning methods for surface-bound chemical vapor deposition of carbon nanotubes

By Hofmann S.   Cantoro M.   Kaempgen M.   Kang D.-J.   Golovko V.B.   Li H.W.   Yang Z.   Geng J.   Huck W.T.S.   Johnson B.F.G.   Roth S.   Robertson J.  

Applied Physics A, Vol. 81, Iss. 8, 2005-12 ,pp. : 1559-1567

Springer Publishing Company

Access to resources Recommend Favorite

Graphite formation on Ni film by chemical vapor deposition

By Yudasaka M.   Kikuchi R.   Matsui T.   Ohki Y.   Baxendale M.   Yoshimura S.   Ota E.  

Thin Solid Films, Vol. 280, Iss. 1, 1996-07 ,pp. : 117-123

Elsevier

Access to resources Recommend Favorite

The automatic experimental design for modeling the reaction mechanisms of chemical vapor deposition processes

By  

PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol. 12, Iss. 7, 2015-07 ,pp. : 904-907

John Wiley & Sons Inc

Access to resources Recommend Favorite

Growth characteristics and electrical resistivity of chemical vapor-deposited tungsten film

By Chang I.-S.   Hon M.-H.  

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 108-113

Elsevier

Access to resources Recommend Favorite