Publisher： John Wiley & Sons Inc
E-ISSN： 1521-3862|948-1907|7-8-9|181-187
ISSN： 0948-1907
Source： CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol.948-1907, Iss.7-8-9, 2015-09, pp. : 181-187
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Atomic layer deposition growth of zirconium doped In 2 O 3 films
By Asikainen T. Ritala M. Leskela M.
Thin Solid Films, Vol. 440, Iss. 1, 2003-09 ,pp. :
Access to resources
Recommend
Effect of water dose on the atomic layer deposition rate of oxide thin films
By Matero R. Rahtu A. Ritala M. Leskela M. Sajavaara T.
Thin Solid Films, Vol. 368, Iss. 1, 2000-06 ,pp. :
Properties of tantalum oxide thin films grown by atomic layer deposition
By Kukli K. Aarik J. Aidla A. Kohan O. Uustare T. Sammelselg V.
Thin Solid Films, Vol. 260, Iss. 2, 1995-05 ,pp. :