Comparison of tin‐doped indium oxide films fabricated by spray pyrolysis and magnetron sputtering

E-ISSN： 1521-4079|50|7|516-521

ISSN： 0232-1300

Source： CRYSTAL RESEARCH AND TECHNOLOGY (ELECTRONIC), Vol.50, Iss.7, 2015-07, pp. : 516-521

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering

By Sasabayashi T. Ito N. Nishimura E. Kon M. Song P.K. Utsumi K. Kaijo A. Shigesato Y.

Thin Solid Films, Vol. 445, Iss. 2, 2003-12 ,pp. : 219-223

Elsevier

Access to resources Recommend Favorite

Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering

By McClure J.C. Joshi R.N. Singh V.P.

Thin Solid Films, Vol. 257, Iss. 1, 1995-02 ,pp. : 32-35

Elsevier

Access to resources Recommend Favorite

Effect of the deposition geometry on the electrical properties within Tin-doped indium oxide film deposited under a given RF magnetron sputtering condition

By You D.J. Choi S.K. Han H.S. Lee J.S. Lim C.B.

Thin Solid Films, Vol. 401, Iss. 1, 2001-12 ,pp. : 229-234

Elsevier

Access to resources Recommend Favorite

Properties of indium tin oxide films with indium tin modulation layers prepared by nano-scale controlled reactive magnetron sputtering

By Takashima Y. Sasaki K. Hata T. Zahirul Alam A.H.M.

Thin Solid Films, Vol. 279, Iss. 1, 1996-06 ,pp. : 131-134

Elsevier

Access to resources Recommend Favorite

Origin of characteristic grain-subgrain structure of tin-doped indium oxide films

By Kamei M. Shigesato Y. Takaki S.

Thin Solid Films, Vol. 259, Iss. 1, 1995-04 ,pp. : 38-45

Elsevier

Access to resources Recommend Favorite