An Investigation into, and Improvement of, the Non‐uniformity of the Flow Field caused by the Pumping Effect in a Stagnation Flow CVD Reactor

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-3862|21|4-5-6|111-121

ISSN： 0948-1907

Source： CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol.21, Iss.4-5-6, 2015-06, pp. : 111-121

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