Local strain and defects in silicon wafers due to nanoindentation revealed by full‐field X‐ray microdiffraction imaging

Publisher： John Wiley & Sons Inc

E-ISSN： 1600-5775|22|4|1083-1090

ISSN： 0909-0495

Source： JOURNAL OF SYNCHROTRON RADIATION (ELECTRONIC), Vol.22, Iss.4, 2015-07, pp. : 1083-1090

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