Ion bombardment of amorphous silicon films during plasma-enhanced chemical vapor deposition in an rf discharge

Author： Abramov A.   Vinogradov A.   Kosarev A.   Shutov M.   Smirnov A.   Orlov K.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7842

Source： Technical Physics, Vol.43, Iss.2, 1998-02, pp. : 180-187

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Modified method of plasma-enhanced chemical vapor deposition of nanocrystalline silicon

By Golubev V.   Medvedev A.   Pevtsov A.   Feoktistov N.  

Technical Physics Letters, Vol. 24, Iss. 10, 1998-10 ,pp. : 758-759

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Nanocrystalline silicon films obtained by plasma enhanced chemical vapor deposition under time-modulated-microwave-power discharge conditions

By Pevtsov A.   Feoktistov N.  

Technical Physics Letters, Vol. 28, Iss. 4, 2002-04 ,pp. : 305-307

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Plasma-enhanced chemical vapour deposition and structural characterization of amorphous chalcogenide films

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-717-Pr8-724

Edp Sciences

Access to resources Recommend Favorite

Plasma-Enhanced Chemical Vapour Deposition of Amorphous Se Films

By  

Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. : C5-1109-C5-1115

Edp Sciences

Access to resources Recommend Favorite

Conductivity switching effect in MIS structures with silicon-based insulators, fabricated by low-frequency plasma-enhanced chemical vapor deposition methods

By Berdnikov A.   Gusev V.   Mironenko A.   Popov A.   Perminov A.   Rudy A.   Chernomordick V.  

Semiconductors, Vol. 47, Iss. 5, 2013-05 ,pp. : 641-646

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite