Mechanisms and kinetics of the initial stages of growth of films grown by chemical vapor deposition

Author： Grigor’ev D.   Kukushkin S.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7842

Source： Technical Physics, Vol.43, Iss.7, 1998-07, pp. : 846-852

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Kinetics of the initial stages of film formation during low pressure chemical vapour deposition of polysilicon by pyrolysis of silane

By  

Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. : Pr3-189-Pr3-196

Edp Sciences

Access to resources Recommend Favorite

Grain boundaries in graphene grown by chemical vapor deposition

By  

New Journal of Physics, Vol. 15, Iss. 3, 2013-03 ,pp. : 1057-1097

IOP Publishing

Access to resources Recommend Favorite

Mid-gap photoluminescence and magnetic properties of GaMnN films grown by metal—organic chemical vapor deposition

By Hai-Ying Xing   Zhang-Cheng Xu   Ming-Qi Cui   Yu-Xin Xie   Guo-Yi Zhang  

Chinese Physics B, Vol. 23, Iss. 10, 2014-10 ,pp. : 107803-107805

IOP Publishing

Access to resources Recommend Favorite

Defect Reduction in GaAs/Si Films with the a-Si Buffer Layer Grown by Metalorganic Chemical Vapor Deposition

By  

Chinese Physics Letters, Vol. 32, Iss. 8, 2015-01 ,pp. : 88101-88104

IOP Publishing

Access to resources Recommend Favorite

Nano-Crystalline Diamond Films Grown by Radio-Frequency Inductively Coupled Plasma Jet Enhanced Chemical Vapor Deposition

By  

Chinese Physics Letters, Vol. 32, Iss. 8, 2015-01 ,pp. : 88104-88107

IOP Publishing

Access to resources Recommend Favorite