High-temperature high-dose implantation of N+ and Al+ ions in 6H-SiC

Author: Yankov R.   Voelskow M.   Kreissig W.   Kulikov D.   Pezoldt J.   Skorupa W.   Trushin Yu.   Kharlamov V.   Tsigankov D.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1063-7850

Source: Technical Physics Letters, Vol.23, Iss.8, 1997-08, pp. : 617-620

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