In situ examination of the chemical etching of SiO2-Si structures using an atomic force microscope

Author: Bukharaev A.   Bukharaeva A.   Nurgazizov N.   Ovchinnikov D.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1063-7850

Source: Technical Physics Letters, Vol.24, Iss.11, 1998-11, pp. : 863-865

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