Atomic hydrogen flux density measured using thin metal films

Author： Kagadei V. Nefyodtsev E. Proskurovsky D. Romanenko S.

ISSN： 1063-7850

Source： Technical Physics Letters, Vol.29, Iss.11, 2003-11, pp. : 897-900

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Low-temperature crystallization of thin nickel films under the action of atomic hydrogen

By Zhavzharov E. Byalik G. Matyushin V.

Technical Physics Letters, Vol. 33, Iss. 7, 2007-07 ,pp. : 571-574

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

A comparative study of the atomic hydrogen penetration into thin vanadium films and silicon oxide-gallium arsenide structures

By Bozhkov V. Kagadei V. Proskurovskii D. Romas’ L.

Technical Physics Letters, Vol. 26, Iss. 10, 2000-10 ,pp. : 926-928

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Voltage-induced insulator-to-metal transition of hydrogen-treated NbO2 thin films

Journal of Physics D: Applied Physics, Vol. 48, Iss. 9, 2015-03 ,pp. : 95301-95305

IOP Publishing

Access to resources Recommend Favorite

THE MAGNETIZATION AND DENSITY OF SPIN POLARIZED ATOMIC HYDROGEN

Le Journal de Physique Colloques, Vol. 41, Iss. C7, 1980-07 ,pp. : C7-147-C7-149

Edp Sciences

Access to resources Recommend Favorite

Atomic layer deposited thin films for corrosion protection

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-493-Pr8-499

Edp Sciences

Access to resources Recommend Favorite