Atomic-layer-deposited (HfO2)1−x(Al2O3)x nanolaminate films on InP with different Al2O3 contents

Author： An Chee-Hong   Mahata Chandreswar   Byun Young-Chul   Kim Hyoungsub  

Publisher： IOP Publishing

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.46, Iss.27, 2013-07, pp. : 275301-275306

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