A new metallic complex reaction etching for transition metals by a low-temperature neutral beam process

Author: Gu Xun   Kikuchi Yoshiyuki   Nozawa Toshihisa   Samukawa Seiji  

Publisher: IOP Publishing

ISSN: 0022-3727

Source: Journal of Physics D: Applied Physics, Vol.47, Iss.32, 2014-08, pp. : 322002-322005

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