Improving feature size uniformity from interference lithography systems with non-uniform intensity profiles

Author: Chang En-Chiang   Mikolas David   Lin Pao-Te   Schenk Tony   Wu Chien-Li   Sung Cheng-Kuo   Fu Chien-Chung  

Publisher: IOP Publishing

ISSN: 0957-4484

Source: Nanotechnology, Vol.24, Iss.45, 2013-11, pp. : 455301-455314

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