Degradation of ferroelectric and weak ferromagnetic properties of BiFeO3 films due to the diffusion of silicon atoms

Author： Ren-Zheng Xiao   Zao-Di Zhang   Pelenovich Vasiliy O.   Ze-Song Wang   Rui Zhang   Hui Li   Yong Liu   Zhi-Hong Huang   De-Jun Fu  

Publisher： IOP Publishing

ISSN： 1674-1056

Source： Chinese Physics B, Vol.23, Iss.7, 2014-07, pp. : 77504-77508

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