A comprehensive study of beryllium diffusion in InGaAs using different forms ofkick-out mechanism

Author: Marcon J.   Koumetz S.   Ketata K.   Ketata M.   Caputo J. G.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|8|1|7-18

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.8, Iss.1, 2010-03, pp. : 7-18

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