Atomic Migration and Defects in Materials

Author: Gupta D.; Jain H.; Siegel R.W.  

Publisher: Trans Tech Publications‎

Publication year: 1991

E-ISBN: 9783035706475

P-ISBN(Paperback): 9783908044079

Subject: TB3 Engineering Materials

Keyword: 工程材料学

Language: ENG

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Description

The book covers various aspects of of diffusion: its fundamental nature, methodology of experimental and analytical techniques, and implications in modern technology. Emphasis is placed on superconducting oxides, nanocrystalline materials, crystalline semiconductors, multicomponent systems, grain boundaries, and amorphous metallic and semiconducting materials.

Chapter

Anelastic Measurements of Atomic Mobility in the Superconductor Y1Ba2Cu3O7-x

Kinetics of Oxygen Diffusion in Superconducting YBa2Cu3O7-δ Ceramic Oxides

Anisotropy of Oxygen Tracer Diffusion in YBa2Cu3O7-δ Single Crystals

Diffusion Phenomena on the External Surface and Substrate-YBCO Film Interface

Migration of Sr at the YBa2Cu3O7-δ Epitaxial Film and (100) SrTiO3 Substrate Interface

The Significance of Diffusion Creep in Simple and Multicomponent Ceramics

Atomistic Treatment of Chemical Diffusion in Multicomponent Alloys: Relation between Intrinsic Diffusion Coefficients and Diffusion Coefficients in the Laboratory Frame

Atomistic Treatment of Chemical Diffusion Phenomena in Oxides and in Metallic Alloys

The Interplay of Solute- and Self-Diffusion - A Key for Revealing Diffusion Mechanisms in Silicon and Germanium

Atomic Diffusion in Silicon

Relationship between Nuclear Spin Relaxation and Diffusion in Glasses

Amphoteric Diffusion of Transition Metals in Si

Diffusion in Nanocrystalline Materials

On the Diffusion Mechanism in bcc Metals, a Neutron Scattering Approach

Effect of High Pressure on Grain Boundary Diffusion during Discontinuous Precipitation in Cu-7.5 at.% In

Author Index

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