Description
The book covers various aspects of of diffusion: its fundamental nature, methodology of experimental and analytical techniques, and implications in modern technology.
Emphasis is placed on superconducting oxides, nanocrystalline materials, crystalline semiconductors, multicomponent systems, grain boundaries, and amorphous metallic and semiconducting materials.
Chapter
Anelastic Measurements of Atomic Mobility in the Superconductor Y1Ba2Cu3O7-x
Kinetics of Oxygen Diffusion in Superconducting YBa2Cu3O7-δ Ceramic Oxides
Anisotropy of Oxygen Tracer Diffusion in YBa2Cu3O7-δ Single Crystals
Diffusion Phenomena on the External Surface and Substrate-YBCO Film Interface
Migration of Sr at the YBa2Cu3O7-δ Epitaxial Film and (100) SrTiO3 Substrate Interface
The Significance of Diffusion Creep in Simple and Multicomponent Ceramics
Atomistic Treatment of Chemical Diffusion in Multicomponent Alloys: Relation between Intrinsic Diffusion Coefficients and Diffusion Coefficients in the Laboratory Frame
Atomistic Treatment of Chemical Diffusion Phenomena in Oxides and in Metallic Alloys
The Interplay of Solute- and Self-Diffusion - A Key for Revealing Diffusion Mechanisms in Silicon and Germanium
Atomic Diffusion in Silicon
Relationship between Nuclear Spin Relaxation and Diffusion in Glasses
Amphoteric Diffusion of Transition Metals in Si
Diffusion in Nanocrystalline Materials
On the Diffusion Mechanism in bcc Metals, a Neutron Scattering Approach
Effect of High Pressure on Grain Boundary Diffusion during Discontinuous Precipitation in Cu-7.5 at.% In