Silicon Carbide and Related Materials 2005

Author: Devaty Robert P.; Larkin David J.; Saddow Stephen E.  

Publisher: Trans Tech Publications‎

Publication year: 2006

E-ISBN: 9783038130536

P-ISBN(Paperback): 9780878494255

Subject: TB3 Engineering Materials

Keyword: 工程材料学

Language: ENG

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Description

Volume is indexed by Thomson Reuters CPCI-S (WoS).Silicon Carbide (SiC), Gallium Nitride (GaN) and Diamond are examples of wide-bandgap semiconductors having chemical, electrical and optical properties which make them very attractive for the fabrication of high-power and high-frequency electronic devices, as well as light-emitters and sensors which have to operate under harsh conditions. These volumes present papers that were read at the International Conference on Silicon Carbide and Related Materials 2005 (ICSCRM 2005); held in Pittsburgh, Pennsylvania, from September 18-23, 2005.These proceedings closely reflected the latest experimental and theoretical advances in the bulk growth of SiC, the epitaxial growth of SiC, physical property characterization, processing and devices. Also included are three shorter chapters on porous SiC, SiC nanoparticles and nanowires, III-nitrides and related materials. The impressive progress reported by these papers will be a stimulating source of ideas for all of those working on these materials.

Chapter

Challenges in Large-Area Multi-Wafer SiC Epitaxy for Production Needs

Techniques for Minimizing the Basal Plane Dislocation Density in SiC Epilayers to Reduce Vf Drift in SiC Bipolar Power Devices

Investigation of In-Grown Dislocations in 4H-SiC Epitaxial Layers

4H-SiC Epitaxial Growth on Carbon-Face Substrates with Reduced Surface Roughness

SiC Warm-Wall Planetary VPE Growth on Multiple 100-mm Diameter Wafers

Epitaxial Layers Grown with HCl Addition: A Comparison with the Standard Process

Lower-Temperature Epitaxial Growth of 4H-SiC Using CH3Cl Carbon Gas Precursor

Investigation of the Mechanism and Growth Kinetics of Homoepitaxial 4H-SiC Growth Using CH3Cl Carbon Precursor

Homoepitaxial Growth of 4H-SiC Using a Chlorosilane Silicon Precursor

SiC-4H Epitaxial Layer Growth Using Trichlorosilane (TCS) as Silicon Precursor

Properties of Thick n- and p-Type Epitaxial Layers of 4H-SiC Grown by Hot-Wall CVD on Off- and On-Axis Substrates

High Epitaxial Growth Rate of 4H-SiC Using Horizontal Hot-Wall CVD

Homoepitaxial Growth and Characterization of 4H-SiC Epilayers by Low-Pressure Hot-Wall Chemical Vapor Deposition

Highly Uniform SiC Epitaxy for MESFET Fabrication

Optimisation of Epitaxial Layer Growth by Schottky Diodes Electrical Characterization

High Purity SiC Epitaxial Growth by Chemical Vapor Deposition Using CH3SiH3 and C3H8 Sources

Selective Etching of Micropipes During Initial Homoepitaxial Growth Stage on Nearly On-Axis 4H-SiC Substrates

Proposal of the Thermal Equilibrium Model for SiC Hydrogen Etching Phenomena

Homoepitaxial Growth of Iron-Doped 4H-SiC Using BTMSM and t-Butylferrocene Precursors for Semi-Insulating Property

Epitaxial Growth of 4H-SiC on 4º Off-Axis (0001) and (000-1) Substrates by Hot-Wall CVD

Epitaxial Growth of 4H-SiC {0001} with Large Off-Angles by Chemical Vapor Deposition

Stability of Thick Layers Grown on (1-100) and (11-20) Orientations of 4H-SiC

Comparison of Propagation and Nucleation of Basal Plane Dislocations in 4H-SiC(000-1) and (0001) Epitaxy

Ab Initio Studies of the Surface Reaction of Si2C and SiC2 with Si on the 4H-SiC (000-1) Surface

Thick Epitaxial Layers on 4º Off-Oriented 4H-SiC Suited for PiN-Diodes with Blocking Voltages above 6.5 kV

Growth of Low Basal Plane Dislocation Density SiC Epitaxial Layers

Experimental Observations of Extended Growth of 4H-SiC Webbed Cantilevers

SiC Migration Enhanced Embedded Epitaxial (ME3) Growth Technology

CVD Epitaxial Growth of 4H-SiC on Porous SiC Substrates

Studies on Selective Growth and In Situ Etching of 4H-SiC Using a TaC Mask

6H-SiC Homoepitaxial Growth and Optical Property of Boron- and Nitrogen-Doped Donor-Acceptor Pair (DAP) Emission of 1º-Off Substrate by Closed-Space Sublimation Method

Epitaxial Growth of 4H-SiC (0001) by Sublimation Method Using Horizontal Furnace

Using Vapour-Liquid-Solid Mechanism for SiC Homoepitaxial Growth on on-axis α-SiC (0001) at Low Temperature

Improvement of 4H-SiC Selective Epitaxial Growth by VLS Mechanism Using Al and Ge Based Melts

2.2 Heteropolytypic and Heteroepitaxial Growth

Relaxation Mechanism of the Defect-Free 3C-SiC Epitaxial Films Grown on Step-Free 4H SiC Mesas

Structure Evolution of 3C-SiC on Cubic and Hexagonal Substrates

Single-Domain 3C-SiC Epitaxially Grown on 6H-SiC by the VLS Mechanism

‘Switch-Back Epitaxy’ as a Novel Technique for Reducing Stacking Faults in 3C-SiC

Growth Acceleration in FLASiC Assisted Short Time Liquid Phase Epitaxy by Melt Modification

Hetero-Epitaxial Growth of 3C-SiC on Silicon Substrates by Plasma Assisted CVD

Selective Epitaxial Growth of 3C-SiC on Si Using Hexamethyldisilane in a Resistance Heated MOCVD Reactor

Growth of 3C-SiC on Si Molds for MEMS Applications

Nitrogen-Doping of Polycrystalline 3C-SiC Films Deposited by Low Pressure Chemical Vapor Deposition

Multi-Scale Simulation of MBE-Grown SiC/Si Nanostructures

3.1 Extended Defects: Stacking Faults and Dislocations

Theory of Dislocations in SiC: The Effect of Charge on Kink Migration

Structure of Carrot Defects in 4H-SiC Epilayers

Characterization of SiC Crystals by Using Deep UV Excitation Raman Spectroscopy

Structures of Comets in a Homoepitaxially Grown 4H-SiC Film Studied by DUV Micro-Raman Spectroscopy

Raman Scattering Analyses of Stacking Faults in 3C-SiC Crystals

Observation of Free Carrier Redistribution Resulting from Stacking Fault Formation in Annealed 4H-SiC

Stacking Faults and 3C Quantum Wells in Hexagonal SiC Polytypes

Silicon Carbide: A Playground for 1D-Modulation Electronics

Peierls Barriers and Core Properties of Partial Dislocations in SiC

Characterization of Stacking Fault-Induced Behavior in 4H-SiC p-i-n Diodes

Recombination Behaviour of Stacking Faults in SiC p-i-n Diodes

Performance of Silicon Carbide PiN Diodes Fabricated on Basal Plane Dislocation-Free Epilayers

Observation of Shrinking and Reformation of Shockley Stacking Faults by PL Mapping

Investigation of Mechanical Stress-Induced Double Stacking Faults in (11-20) Highly N-Doped 4H-SiC Combining Optical Microscopy, TEM, Contrast Simulation and Dislocation Core Reconstruction

Overlapping Shockley/Frank Faults in 4H-SiC PiN Diodes

Examining Dislocations in SiC Epitaxy by Light Emission from Simple Diode Structures

Photoemission of 4H-SiC pin-Diodes Epitaxied by the Sublimation Method

Investigation of Structural Stability in 4H-SiC Structures with Heavy Ion Implanted Interface

Origin of Surface Morphological Defects in 4H-SiC Homoepitaxial Films

Structure of “Star” Defect in 4H-SiC Substrates and Epilayers

Synchrotron X-ray Topographic Analysis of Dislocation Structures in Bulk SiC Single Crystal

Simulation of Threading Edge Dislocation Images in X-Ray Topographs of Silicon Carbide Homo-Epilayers

Development of Non-Destructive In-House Observation Techniques for Dislocations and Stacking Faults in SiC Epilayers

Why Are Only Some Basal Plane Dislocations Converted to Threading Edge Dislocations During SiC Epitaxy?

3-Dimensional Non-Destructive Dislocation Analyses in SiC Measured by Planar Electron-Beam-Induced Current Method

Effect of Crystal Defects on Reverse I-V Characteristics of 4H-SiC APDs

Structural Defects and Critical Electric Field in 3C-SiC

Giant Burgers Vector Micropipe-Dislocations in Silicon Carbide Investigated by Atomic Force Microscopy

Open Core Dislocations and Surface Energy of SiC

Comparison between Measurement Techniques Used for Determination of the Micropipe Density in SiC Substrates

A New Method of Mapping and Counting Micropipes in SiC Wafers

Identification of Polytypes in Sublimation Grown 4H-SiC Crystals by High Resolution X-Ray Diffractometry

3.2 Point Defects

Optical Studies of Deep Centers in Semi-Insulating SiC

Investigation of the Electronic Structure of the UD-4 Defect in 4H-SiC by Optical Techniques

High Energy Local Vibrational Modes of Carbon Aggregates in SiC: Experimental and Theoretical Insight

Non-Equilibrium Carrier Diffusion and Recombination in Semi-Insulating PVT Grown Bulk 6H-SiC Crystals

Origin of the Up-Conversion Process in 4H SiC

A Combined Photoluminescence and Electron Paramagnetic Resonance Study of Low Energy Electron Irradiated 4H SiC

Investigation of the Displacement Threshold of Si in 4H SiC

Long Distance Point Defect Migration in Irradiated SiC Observed by Deep Level Transient Spectroscopy

Deep Level Defects Related to Carbon Displacements in n- and p-Type 4H-SiC

Deep Traps and Charge Carrier Lifetimes in 4H-SiC Epilayers

Deep Electron and Hole Traps in 6H-SiC Bulk Crystals Grown by the Halide Chemical Vapor Deposition

Deep Hole Traps in As-Grown 4H-SiC Epilayers Investigated by Deep Level Transient Spectroscopy

Deep Level near EC – 0.55 eV in Undoped 4H-SiC Substrates

Deep Traps in High-Purity Semi-Insulating 6H-SiC Substrates: Thermally Stimulated Current Spectroscopy

Quenching Photoconductivity and Photoelectric Memory in 6H-SiC

Deep Level Point Defects in Semi-Insulating SiC

Divacancy and Its Identification: Theory

Divacancy Model for P6/P7 Centers in 4H- and 6H-SiC

Thermal Evolution of Defects in Semi-Insulating 4H SiC

Evidence of the Ground Triplet State of Silicon-Carbon Divacancies (P6, P7 Centers) in 6H SiC: An EPR Study

Signature of the Negative Carbon Vacancy-Antisite Complex

Electron Paramagnetic Resonance Study of the HEI4/SI5 Center in 4H-SiC

Relationship between the EPR SI-5 Signal and the 0.65 eV Electron Trap in 4H- and 6H-SiC Polytypes

Carbon Related Split-Interstitials in Electron-Irradiated n-type 6H-SiC

Identification of the Triplet State N-V Defect in Neutron Irradiated Silicon Carbide by Electron Paramagnetic Resonance

Possible Role of Hydrogen within the So-Called X Center in Semi-Insulating 4H-SiC

Trapping Recombination Process and Persistent Photoconductivity in Semi-Insulating 4H SiC

Identification of Deep Level Defects in SiC Bipolar Junction Transistors

Vacancy Defects Induced by Low Energy Electron Irradiation in 6H and 3C-SiC Monocrystals Characterized by Positron Annihilation Spectroscopy and Electron Paramagnetic Resonance

Clustering of Vacancies in Semi-Insulating SiC Observed with Positron Spectroscopy

3.3 Impurities

3.3.1 Shallow Donors and Acceptors, Hydrogen

Electronic Raman Studies of Shallow Donors in Silicon Carbide

Evidence for Phosphorus on Carbon and Silicon Sites in 6H and 4H SiC

Photoluminescence of Phosphorous Doped SiC

Shallow P Donors in 3C-, 4H- and 6H-SiC

Dependence of the Ionization Energy of Phosphorous Donor in 4H-SiC on Doping Concentration

Donor-Acceptor Pair Luminescence of Phosphorus-Aluminum and Nitrogen-Aluminum Pairs in 4H SiC

A Theoretical Study on Doping of Phosphorus in Chemical Vapor Deposited SiC Layers

New Aspects in n-type Doping of SiC with Phosphorus

Conditions and Limitations of Using Low-Temperature Photoluminescence to Determine Residual Nitrogen Levels in Semi-Insulating SiC Substrates

Evaluating and Improving SIMS Method for Measuring Nitrogen in SiC

Kinetic Mechanisms for the Deactivation of Nitrogen in SiC

Electrical Properties of Undoped 6H- and 4H-SiC Bulk Crystals Grown by Halide Chemical Vapor Deposition

Accurate CsM+ SIMS Aluminum Dopant Profiling in SiC

Results of SIMS, LTPL and Temperature-Dependent Hall Effect Measurements Performed on Al-Doped α-SiC Substrates Grown by the M-PVT Method

In-Diffusion, Trapping and Out-Diffusion of Deuterium in 4H-SiC Substrates

3.3.2 Transition Metals and Rare Earths

Electronic Structure and Magnetic Properties of Transition Metal Doped Silicon Carbide in Different Polytypes

The Optical Admittance Spectroscopy of the Vanadium Donor and Acceptor Levels in Semi-Insulating 4H-SiC and 6H-SiC

Luminescence and EPR Characterization of Vanadium Doped Semi-Insulating 4H SiC

Co-Doping of Er-Doped SiC with Oxygen – A Promising Way Towards Efficient 1540 nm Emission at Room Temperature?

Europium Induced Deep Levels in Hexagonal Silicon Carbide

Cathodoluminescence Measurements and Thermal Activation of Rare Earth Doped (Tb3+, Dy3+ and Eu3+) a-SiC Thin Films Prepared by rf Magnetron Sputtering

3.4 Surfaces and Interfaces

Hydrogen Nanochemistry Achieving Clean and Pre-Oxidized Silicon Carbide Surface Metallization

Temperature Induced Phase Transformation on the 4H-SiC(11-20) Surface

SiC Pore Surfaces: Surface Studies of 4H-SiC(1-102) and 4H-SiC(-110-2)

Experimental Study of the Formation and Oxidation of the Sm/4H-SiC Surface Alloy

Low Energy Ion Modification of 3C-SiC Surfaces

3.5 Fundamental Properties

Phonons in SiC from INS, IXS, and Ab-Initio Calculations

Infrared Reflectance Study of 3C-SiC Grown on Si by Chemical Vapor Deposition

Precise Determination of Thermal Expansion Coefficients Observed in 4H-SiC Single Crystals

Thermal Lens Technique for the Determination of SiC Thermo-Optical Properties

Wannier-Stark Ladder and Negative Differential Conductance in 4H-SiC

3.6 Wafer Mapping

Characterization of SiC Wafers by Photoluminescence Mapping

Correlation between Room Temperature Photoluminescence and Resistivity in Semiinsulating Silicon Carbide

Simple, Calibrated Analysis and Mapping of SiC Wafer Defects by Birefringence Imaging

SiC Substrate Doping Profiles Using Commercial Optical Scanners

Characterization of SiC Substrates Using X-Ray Rocking Curve Mapping

Microwave Dielectric Loss Characterization of Silicon Carbide Wafers

Chapter 4. Porous SiC, SiC Nanoparticles and Nanowires

Columnar Pore Growth in n-Type 6H SiC

A Comparison of Various Surface Finishes and the Effects on the Early Stages of Pore Formation during High Field Etching of SiC

Brillouin Spectra of Porous p-Type 6H-SiC

Columnar Morphology of Porous Silicon Carbide as a Protein-Permeable Membrane for Biosensors and Other Applications

Novel Polycrystalline SiC Films Containing Nanoscale Through-Pores by Selective APCVD

Sol-Gel Silicon Carbide for Photonic Applications

Formation, Morphology and Optical Properties of SiC Nanopowder

A Simple Method to Synthesize Nano-Sized 3C-SiC Powder Using Hexamethyldisilane in a CVD Reactor

Fabrication and Electrical Transport Properties of CVD Grown Silicon Carbide Nanowires (SiC NWs) for Field Effect Transistor

Thermodynamic Analysis of Synthetic Potentialities of the nSiC + SiO2 Starting System: SiC Gas-Phase Transport via Si(g) and CO(g)

Chapter 5. Processing of SiC

5.1 Implantation and Doping of SiC

Ion Implantation Processing and Related Effects in SiC

Advances in Two-Dimensional Dopant Profiling and Imaging of 4H-SiC Devices

Annealing Behavior of N+-Implantation-Induced Defects in SiC at Low Temperatures

Impact of Annealing Temperature Ramps on the Electrical Activation of N+ and P+ Co-Implanted SiC Layers

Impurity Concentration Dependence of Recrystallization Process of Phosphorus Implanted 4H-SiC(11-20)

Activation Treatment of Ion Implanted Dopants Using Hybrid Super RTA Equipment

Development and Investigation on EBAS-100 of 100 mm Diameter Wafer for 4H-SiC Post Ion Implantation Annealing

Correlation between Current Transport and Defects in n+/p 6H-SiC Diodes

Current Analysis of Ion Implanted p+/n 4H-SiC Junctions: Post-Implantation Annealing in Ar Ambient

Ion Implanted p+/n Diodes: Post-Implantation Annealing in a Silane Ambient in a Cold-Wall Low-Pressure CVD Reactor

Laser Direct Write Doping and Metallization Fabrication of Silicon Carbide PIN Diodes

Extracting Activation and Compensation Ratio from Aluminum Implanted 4H-SiC by Modeling of Resistivity Measurements

Variations in the Effects of Implanting Al at Different Concentrations into SiC

Effect of Surface Orientation and Off-Angle on Surface Roughness and Electrical Properties of p-Type Impurity Implanted 4H-SiC Substrate after High Temperature Annealing

Post-Implantation Annealing in a Silane Ambient Using Hot-Wall CVD

Kick-Out Phenomena in Epitaxially Boron- and Aluminum-Doped 4H-SiC during Implantation and Annealing Processes

Observation of Thermal-Annealing Evolution of Defects in Ion-Implanted 4H-SiC by Luminsescence

High Dose High Temperature Ion Implantation of Ge into 4H-SiC

Hydrogen-Induced Blistering of SiC: The Role of Post-Implant Multi-Step Annealing Sequences

5.2 Contacts

5.2.1 Ohmic Contacts

An Approach to Improving the Morphology and Reliability of n-SiC Ohmic Contacts to SiC Using Second-Metal Contacts

Ni Graphite Intercalated Compounds in Ohmic Contact Formation on SiC

Ohmic Contact for C-face n-Type 4H-SiC with Reduced Graphite Precipitation

Structural Properties of Titanium-Nickel Films on Silicon Carbide Following High Temperature Annealing

Die Bonding Issues on Silicon Carbide Diodes

Composite Ohmic Contacts to SiC

Tantalum-Ruthenium Diffusion Barriers for Contacts to SiC

Investigation of TiW Contacts to 4H-SiC Bipolar Junction Devices

Characterization of Ti/Al Ohmic Contacts to p-Type 4H-SiC Using Cathodoluminescence and Auger Electron Spectroscopies

Ohmic Contacts to P-Type Epitexial and Imlanted 4H-SiC

Ohmic Contacts on p-Type SiC Using Al/C Films

Ti/AlNi/W and Ti/Ni2Si/W Ohmic Contacts to P-Type SiC

5.2.2 Schottky Contacts

Nanoscale Deep Level Defect Correlation with Schottky Barriers in 4H-SiC/Metal Diodes

A Study of Inhomogeneous Schottky Diodes on n-Type 4H-SiC

Formation and Properties of Schottky Diodes on 4H-SiC after High Temperature Annealing with Graphite Encapsulation

Diffusion Welding Techniques for Power SiC Schottky Packaging

Evaluation of Schottky Barrier Height of Al, Ti, Au ,and Ni Contacts to 3C-SiC

Comparison of Electrical Characteristics of 4H-SiC(0001) and (000-1) Schottky Barrier Diodes

High Temperature Operation of Silicon Carbide Schottky Diodes with Recoverable Avalanche Breakdown

5.3 Oxides and Other Dielectrics

Si/SiO2 and SiC/SiO2 Interfaces for MOSFETs – Challenges and Advances

Nitrogen and Hydrogen Induced Trap Passivation at the SiO2/4H-SiC Interface

Impact of Dislocations on Gate Oxide in SiC MOS Devices and High Reliability ONO Dielectrics

High Channel Mobility 4H-SiC MOSFETs

Improved 4H-SiC MOS Interfaces Produced via Two Independent Processes: Metal Enhanced Oxidation and 1300°C NO Anneal

Characterization of 4H-SiC MOSFETs with NO-Annealed CVD Oxide

Investigation of SiO2-SiC Interface by High-Resolution Transmission Electron Microscope

Interfacial Properties of SiO2 Grown on 4H-SiC: Comparison between N2O and Wet O2 Oxidation Ambient

Effect of Reactive-Ion Etching on Thermal Oxide Properties on 4H-SiC

Improved Dielectric and Interface Properties of 4H-SiC MOS Structures Processed by Oxide Deposition and N2O Annealing

Nitrogen Implantation - An Alternative Technique to Reduce Traps at SiC/SiO2-Interfaces

Process-Dependent Charges and Traps in Dielectrics on SiC

Low-Temperature Post-Oxidation Annealing Using Atomic Hydrogen Radicals Generated by High-Temperature Catalyzer for Improvement in Reliability of Thermal Oxides on 4H-SiC

Off-Angle Dependence of Characteristics of 4H-SiC-Oxide Interfaces

On Separating Oxide Charges and Interface Charges in 4H-SiC Metal-Oxide-Semiconductor Devices

Observation of Deep-Level Centers in 4H-Silicon Carbide Metal Oxide Semiconductor Field Effect Transistors by Spin Dependent Recombination

Forming Gas Annealing of the Carbon PbC Center in Oxidized Porous 3C- and 4H-SiC: An EPR Study

Where Would the Electronic States of a Small Graphite-Like Carbon Island Contribute to the SiC/SiO2 Interface State Density Distribution?

Scanning Tunnenling Spectroscopy of Oxidized 6H-SiC Surfaces

Ellipsometric and XPS Studies of 4H-SiC/SiO2 Interfaces, and Sacrificial Oxide Stripped 4H-SiC Surfaces

Real Time Observation of SiC Oxidation Using an In Situ Ellipsometer

Fast Non-Contact Dielectric Characterization for SiC MOS Processing

High Temperature Reliability of SiC n-MOS Devices up to 630 °C

High Inversion Channel Mobility of 4H-SiC MOSFETs Fabricated on C(000-1) Epitaxial Substrate with Vicinal (Below 1º) Off-Angle

PECVD Deposited TEOS for Field-Effect Mobility Improvement in 4H-SiC MOSFETs on the (0001) and (11-20) Faces

Process Optimisation for 4H-SiC MOSFET Applications

Determination of the Temperature and Field Dependence of the Interface Conductivity Mobility in 4H-SiC/SiO2

Modelling of the Anomalous Field-Effect Mobility Peak of O-Ta2Si/4H-SiC High-k MOSFETs Measured in Strong Inversion

Gamma Irradiation Effects on 4H-SiC MOS Capacitors and MOSFETs

High Temperature Annealing Study of Al2O3 Deposited by ALCVD on n-Type 4H-SiC

Experimental and First-Principles Studies of the Band Alignment at the HfO2/4H-SiC (0001) Interface

Structural and Morphological Properties of Ultrathin HfO2 Dielectrics on 4H-SiC (0001)

Low Temperature Deposition of HfO2 Gate Insulator on SiC by Metalorganic Chemical Vapor Deposition

Electrical Properties of the La2O3/4H-SiC Interface Prepared by Atomic Layer Deposition Using La(iPrCp)3 and H2O

Theoretical Study of an Effective Field Plate Termination for SiC Devices Based on High-k Dielectrics

5.4 Chemical-Mechanical Polishing of SiC

Preparation and Evaluation of Damage Free Surfaces on Silicon Carbide

Selectivity and Residual Damage of Colloidal Silica Chemi-Mechanical Polishing of Silicon Carbide

Augmented CMP Techniques for Silicon Carbide

5.5 Micromachining and MEMS

Characterization of Low Stress, Undoped LPCVD Polycrystalline SiC Films for MEMS Applications

Mechanical Testing of Flexible Silicon Carbide Interconnect Ribbons

Micromachining of Novel SiC on Si Structures for Device and Sensor Applications

Deep Reactive Ion Etching (DRIE) of High Aspect Ratio SiC Microstructures Using a Time-Multiplexed Etch-Passivate Process

Via Hole Formation in Silicon Carbide by Laser Micromachining

Development of a Microstrip SiC MMIC Process

Chapter 6. SiC Devices

6.1 Overviews

Energy Efficiency: The Commercial Pull for SiC Devices

SiC Device Applications: Identifying and Developing Commercial Applications

Developments in Hybrid Si – SiC Power Modules

6.2 Unipolar Devices

6.2.1 Schottky Diodes

Almost Ideal Thermionic-Emission Properties of Ti-Based 4H-SiC Schottky Barrier Diodes

Electrothermal Issues in 4H-SiC 600 V Schottky Diodes in Forward Mode: Experimental Characterization, Numerical Simulations and Analytical Modelling

A Surge Current Stable and Avalanche Rugged SiC Merged pn Schottky Diode Blocking 600V Especially Suited for PFC Applications

Performance Comparison of 1.5kV 4H-SiC Buried Channel and Lateral Channel JBS Rectifiers

4.5 kV-8 A SiC-Schottky Diodes / Si-IGBT Modules

Correlation between Leakage Current and Ion-Irradiation Induced Defects in 4H-SiC Schottky Diodes

Design and Analysis of a Dual-Step Field-Plate Terminated 4H-SiC Schottky Diode Using SiO2/High-K Dielectric Stack

Fabrication of 4H-SiC Floating Junction Schottky Barrier Diodes (Super-SBDs) and their Electrical Properties

Optimization of a SiC Super-SBD Based on Scaling Properties of Power Devices

6.2.2 JFETs and MESFETs

Fast Switching (41 MHz), 2.5 mΩ•cm2, High Current 4H-SiC VJFETs for High Power and High Temperature Applications

10 kV, 87 mΩcm2 Normally-Off 4H-SiC Vertical Junction Field-Effect Transistors

Design, Fabrication and Application of 4H-SiC Trenched-and-Implanted Vertical JFETs

Analytical Modelling of I-V Characteristics for 4H-SiC Enhancement Mode VJFET

Design Considerations of a New 4H-SiC Enhancement-Mode Lateral Channel Vertical JFET for Low-Loss Switching Operation

Low On-Resistance in 4H-SiC RESURF JFETs Fabricated with Dry Process for Implantation Metal Mask

SiC Smart Power JFET Technology for High-Temperature Applications

Inherently Safe Resonant Reset Forward Converter Using a Bias-Enhanced SiC JFET

Current Sensing for SiC Power Devices

Fabrication of 700V SiC-SIT with Ultra-Low On-Resistance of 1.01mΩ•cm2

RF and DC Characterization of Self-Aligned L-Band 4H-SiC Static Induction Transistors

SiC MESFET with a Double Gate Recess

High Power High Efficiency Lateral Epitaxy MESFETs in Silicon Carbide

RF Characteristics of a Fully Ion-Implanted MESFET on a Bulk Semi-Insulating 4H-SiC Substrate

High-Frequency SiC MESFETs with Silicon Dioxide/Silicon Nitride Passivation

Double Gate 180V-128mA/mm SiC-MESFET for Power Switch Applications

The Role of Residual Source/Drain Implant Damage Traps on SiC MESFET Drain I-V Characteristics

6.2.3 MOSFETs

Time Domain and Frequency Analysis of Random Telegraph Signal and the Contributions of G-R Centres to I-V Instabilities in 4H-SiC MESFETs

SiC Power MOSFETs – Status, Trends and Challenges

Development of 8 mΩ-cm2, 1.8 kV 4H-SiC DMOSFETs

4H-SiC DMOSFETs Processed Using Graphite Capped Implant Activation Anneal

Optimum Design of Short-Channel 4H-SiC Power DMOSFETs

Realization of Large Area Vertical 3C-SiC MOSFET Devices

High Power-Density 4H-SiC RF MOSFETs

4.3 mΩcm2, 1100 V 4H-SiC Implantation and Epitaxial MOSFET

Fabrication and Performance of 1.2 kV, 12.9 mΩcm2 4H-SiC Epilayer Channel MOSFET

Switching Characteristics of SiC-MOSFET and SBD Power Modules

Characterization of 4H-SiC MOSFETs Formed on the Different Trench Sidewalls

The Characteristics of MOSFETs Fabricated on the Trench Sidewalls of Various Faces Using 4H-SiC (11-20) Substrates

Fabrication of 4H-SiC p-Channel MOSFET with High Channel Mobility

Reduction of On-Resistance in 4H-SiC Multi-RESURF MOSFETs

Fabrication of 4H-SiC DIMOSFETs by High-Temperature (>1400°C) Rapid Thermal Oxidation and Nitridation Using Cold-Wall Oxidation Furnace

A Study on the Reliability and Stability of High Voltage 4H-SiC MOSFET Devices

Bias Stress-Induced Threshold-Voltage Instability of SiC MOSFETs

Using a First Principles Coulomb Scattering Mobility Model for 4H-SiC MOSFET Device Simulation

Optimisation of 4H-SiC MOSFET Structures for Logic Applications

6.3 Bipolar Devices

6.3.1 Diodes

Evolution of Drift-Free, High Power 4H-SiC PiN Diodes

Measurements of Breakdown Field and Forward Current Stability in 3C-SiC pn Junction Diodes Grown on Step-Free 4H-SiC

High-Temperature (up to 800 K) Operation of 6-kV 4H-SiC Junction Diodes

About the Nature of Recombination Current in 4H-SiC pn Structures

Charge Induced in 6H-SiC PN Diodes by Irradiation of Oxygen Ion Microbeams

Demonstration of a 4H SiC Betavoltaic Cell

High Current 6 kV 4H-SiC PiN Diodes for Power Module Switching Applications

Dynamic Characteristics of 4H-SiC pin Diode on (000-1)C-Face with Small Forward Degradation

Improving Switching Characteristics of 4H-SiC Junction Rectifiers Using Epitaxial and Implanted Anodes with Epitaxial Refill

Characteristics and Ionization Coefficient Extraction of 1kV 4H-SiC Implanted Anode PiN Rectifiers with Near Ideal Performance Fabricated Using AlN Capped Annealing

Demonstration of High-Voltage 4H-SiC Bipolar RF Power Limiter

Investigation of Packaged High-Voltage 4H SiC pin Diodes in the 20-700 °C Temperature Range

CM-Wave Modulator with High-Voltage 4H SiC pin Diodes

Numerical Investigation of SiC Devices Performance Considering the Incomplete Dopant Ionization

High Power Photoconductive Switch of 4H-SiC with Damage-Free Electrodes by Using n+-GaN Subcontact Layer

6.3.2 Transistors and Thyristors

Advances in SiC GTO Development and Its Applications

A 1cm × 1cm, 5kV, 100A, 4H-SiC Thyristor Chip for High Current Modules

Simulation of High-Voltage Injection-Enhanced 4H-SiC N-Channel IGBTs with Forward Drop Approaching that of a PiN Junction Rectifier

Simulations of 10 kV Trench Gate IGBTs on 4H-SiC

Influence of Basal Plane Dislocation Induced Stacking Faults on the Current Gain in SiC BJTs

First Demonstration of 2.1 kW Output Power at 425 MHz Using 4H-SiC RF Power BJTs

1836 V, 4.7 mΩ•cm2 High Power 4H-SiC Bipolar Junction Transistor

4H-SiC Bipolar Transistors with UHF and L-Band Operation

Current Gain Dependence on Emitter Width in 4H-SiC BJTs

Optimization of the Specific On-Resistance of 4H-SiC BJTs

Performance Assessment of 4H-SiC Bipolar Junction Transistors and Insulated Gate Bipolar Transistors

High Temperature Characterization of 4H-SiC Bipolar Junction Transistors

Analysis of the Effect of Temperature on Base Current Gain in Power 4H-SiC BJTs

400 Watt Boost Converter Utilizing Silicon Carbide Power Devices and Operating at 200°C Baseplate Temperature

Device Options and Design Considerations for High-Voltage (10-20 kV) SiC Power Switching Devices

Novel Power Si/4H-SiC Heterojunction Tunneling Transistor (HETT)

6.4 Sensors and Detectors

SiC-Based MOSFETs for Harsh Environment Emissions Sensors

Development of Ultra High Sensitivity UV Silicon Carbide Detectors

Silicon Carbide Power Diodes as Radiation Detectors

Minimum Ionizing Particle Detector Based on p+n Junction SiC Diode

Radiation Hard Devices Based on SiC

The Limit of SiC Detector Energy Resolution in Ion Spectometry

Chapter 7. III-Nitrides

7.1 Growth of III-Nitrides

Reduction of Defects in GaN Epitaxial Films Grown Heteroepitaxially on SiC

Molecular Beam Epitaxy of Cubic Group III-Nitrides on Free-Standing 3C-SiC Substrates

Surface Morphology of GaN Films Grown by RF-Plasma MBE Using Lateral Overgrowth and Low-Temperature Ga-rich Condition

The Effect of Aluminum Nitride-Silicon Carbide Alloy Buffer Layers on the Sublimation Growth of Aluminum Nitride on SiC (0001) Substrates

Growth of AlN and AlN-SiC Solid Solution by Sublimation Method

7.2 Physical Properties and Characterization of III-Nitrides

Improved Structural Quality and Carrier Decay Times in GaN Epitaxy on SiN and TiN Porous Network Templates

Electron Microscopy Investigation of the Role of Surface Steps in the Generation of Dislocations during MOCVD Growth of GaN on 4H-SiC

Strain Relaxation in GaN/AlN Films Grown on Vicinal and On-Axis SiC Substrates

Anisotropic Properties of GaN Studied by Raman Scattering

Structural Characterization of Bulk AlN Single Crystals Grown from Self-Seeding and Seeding by SiC Substrates

7.3 III-Nitride Surfaces and Interfaces

Asymmetric Interface Densities on n and p Type GaN MOS Capacitors

Effects of Rapid Thermal Annealing Treatment on the Surface Band Bending of n-type GaN Studied by Surface Potential Electric Force Microscopy

Quantitative Mobility Spectrum Analysis of AlGaN/GaN Heterostructures Using Variable-Field Hall Measurements

Growth and Investigation of n-AlGaN/p-6H-SiC/n-6H-SiC Heterostructures

7.4 III-Nitride Devices

Structural Properties and Electrical Characteristics of Homoepitaxial GaN PiN Diodes

Electron Injection from GaN to SiC and Fabrication of GaN/SiC Heterojunction Bipolar Transistors

Direct Electrical Characteristics of GaN Nanowire Field Effect Transistor (FET) without Assistance of E-Beam Lithography (EBL)

GaN Resistive Gas Sensors for Hydrogen Detection

Chapter 8. Related Materials

Atomic Layer Epitaxy of (Si1-xC1-y)Gex+y Layers on 4H-SiC

Effect of the Crystallization Conditions on the Epitaxial Relationship of Si Deposited on 3C-SiC(100)

Optical Characterization of ZnO Materials Grown by Modified Melt Growth Technique

The Properties of n-ZnO/p-SiC Heterojunctions and their Potential Applications for Devices

Role of Oxygen in Growth of Carbon Nanotubes on SiC

Structural and Electrical Characteristics of Carbon Nanotubes Formed on Silicon Carbide Substrates by Surface Decomposition

First Principles Modelling of Scroll-to-Nanotube Defect: Screw-Type Dislocation

SNOM Investigation of Surface Morphology Changes during Cr/Au Contact Fabrication on Single-Crystal CVD Diamond

Keywords Index

Authors Index

The users who browse this book also browse