Semiconductor Materials by Ultrasonic Spray Pyrolysis and Their Application in Electronic Devices
( Pyrolysis )
Publication series ： Pyrolysis
Author： Miguel Dominguez Jose A. Luna-Lopez and Francisco J. Flores
Publisher： IntechOpen
Publication year： 2017
E-ISBN: INT6519367548
P-ISBN(Paperback): 9789535133117
P-ISBN(Hardback): 9789535133124
Subject： O414 Thermodynamics and Statistical Physics;TH Machinery and Instrument Industry
Keyword： Energy technology & engineering,热力学与统计物理学
Language： ENG
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Semiconductor Materials by Ultrasonic Spray Pyrolysis and Their Application in Electronic Devices
Description
Ultrasonic spray pyrolysis is a deposition technique that enables a fine mist of the precursor solution in order to deposit higher-density thin films. This characteristic makes of great potential the use of ultrasonically spray-deposited semiconductors films for low-cost, transparent, flexible and large-area applications. In this chapter, low-temperature deposition and characterization of ultrasonically spray-deposited zinc oxide (ZnO) films are presented. The ZnO films deposited by ultrasonic spray pyrolysis at 200°C were characterized by optical transmittance, photoluminescence spectroscopy, X-ray diffraction and Fourier transform infrared spectroscopy. The study of low-temperature annealing of ZnO films is also presented. Moreover, the characterization of aluminum-doped ZnO films deposited by ultrasonic spray pyrolysis at 200°C is presented. Finally, applications of these ultrasonic spray-deposited films in electronic devices are presented.
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