Chapter 2 Recent Advances in Two-Photon Stereolithography

1. Introduction

2. Two-photon stereolithography

2.1. Introduction

2.2. Two-photon absorption

2.3. Experimental set-up for TPS

3. Materials for two-photon stereolithography

3.1. Free-radical photoresists

3.2. Cationic photoresist

3.3. Advanced functional materials

4. Current challenges in TPS

4.1. Resolution

4.1.1. Overview of the different strategies

4.1.2. STED-like lithography

4.1.2.1. Two-color photoinitiation/inhibition lithography

4.1.2.2. RAPID lithography

4.1.2.3. STED lithography

4.1.3. Diffusion-assisted TPS

4.1.4. Other methods

4.2. Recent advances in throughput: From prototyping towards production of semi-series

4.2.1. Influence of the scanning mode

4.2.2. Replication

4.2.3. Multi-focal TPS

4.2.4. Currently speed of TPS process

5. Conclusion and perspectives

Author details

References