Substrate-independent sulfur-activated dielectric and barrier-layer surfaces to promote the chemisorption of highly polarizable metallorganics

Author： Senkevich J.J.   Yang G.R.   Tang F.   Wang G.C.   Lu T.M.   Cale T.S.   Jezewski C.   Lanford W.A.  

Publisher： Springer Publishing Company

ISSN： 0947-8396

Source： Applied Physics A, Vol.79, Iss.7, 2004-11, pp. : 1789-1796

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Supramolecular Surface Chemistry: Substrate‐Independent, Phosphate‐Driven Growth of Polyamine‐Based Multifunctional Thin Films

By  

ADVANCED FUNCTIONAL MATERIALS, Vol. 25, Iss. 26, 2015-07 ,pp. : 4144-4152

John Wiley & Sons Inc

Access to resources Recommend Favorite

Low‐Cost and Scaled‐Up Production of Fluorine‐Free, Substrate‐Independent, Large‐Area Superhydrophobic Coatings Based on Hydroxyapatite Nanowire Bundles

By  

CHEMISTRY - A EUROPEAN JOURNAL, Vol. 24, Iss. 2, 2018-01 ,pp. : 416-424

John Wiley & Sons Inc

Access to resources Recommend Favorite

Nature of chemical states of sulfur embedded in atomic‐layer‐deposited HfO2 film on Ge substrate for interface passivation

By  

PHYSICA STATUS SOLIDI - RAPID RESEARCH LETTERS (ELECTRONIC), Vol. 1862-6254, Iss. 9, 2015-09 ,pp. : 511-515

John Wiley & Sons Inc

Access to resources Recommend Favorite

Nature of chemical states of sulfur embedded in atomic‐layer‐deposited HfO2 film on Ge substrate for interface passivation

By  

PHYSICA STATUS SOLIDI - RAPID RESEARCH LETTERS (ELECTRONIC), Vol. 9, Iss. 9, 2015-09 ,pp. : 511-515

John Wiley & Sons Inc

Access to resources Recommend Favorite

NO x removal using nitrogen gas activated by dielectric barrier discharge at atmospheric pressure

By Nagao I.   Nishida M.   Yukimura K.   Kambara S.   Maruyama T.  

Vacuum, Vol. 65, Iss. 3, 2002-05 ,pp. : 481-487

Elsevier

Access to resources Recommend Favorite