Multiple release layer study of the intrinsic lateral etch rate of the epitaxial lift-off process

Author: Voncken M.M.A.J.   Schermer J.J.   Bauhuis G.J.   Mulder P.   Larsen P.K.  

Publisher: Springer Publishing Company

ISSN: 0947-8396

Source: Applied Physics A, Vol.79, Iss.7, 2004-11, pp. : 1801-1807

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