Effect of Silicon Dioxide Hardness on Scratches in Interlevel Dielectric Chemical–Mechanical Polishing

Author： Kwon Tae-Young   Cho Byoung-Jun   Venktesh R. Prasanna   Ramachandran Manivannan   Kim Hyuk-Min   Hong Chang-Ki   Park Jin-Goo  

Publisher： Taylor & Francis Ltd

ISSN： 1040-2004

Source： Tribology Transactions, Vol.57, Iss.2, 2014-03, pp. : 190-197

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