Vacuum Technology and Applications

Author: Hucknall   David J.  

Publisher: Elsevier Science‎

Publication year: 2013

E-ISBN: 9781483103334

P-ISBN(Paperback): 9780750611459

Subject: TB7 vacuum technology

Keyword: 物理学

Language: ENG

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Description

Vacuum Technology and Applications reviews the most commonly encountered methods for the production, containment, and measurement of subatmospheric pressure. This book also outlines a number of very important applications of this technology.

This text is organized into eight chapters and begins with a brief survey of the fundamental principles of vacuum technology. The succeeding chapters deal with the pumps used for the production of rough-medium and high-ultra-high vacua. These chapters specifically cover their principles, performance, and applications. These topics are followed by a discussion of the devices for residual gas analysis and partial pressure measurement. Other chapters consider the aspects of leak detection using He-specific mass spectrometer and the materials, components, and fabrication of vacuum devices. The final chapters explore the application of vacuum technology in critical areas of industrial activity, such as thin-film technology, semiconductor, metallurgy, and chemical industry.

This book will prove useful to practicing mechanical, chemical, and design engineers.

The users who browse this book also browse


No browse record.