Lithography for VLSI
：VLSI Electronics Microstructure Science
( Volume 16 )
Publication subTitle ：VLSI Electronics Microstructure Science
Publication series ：Volume 16
Author： Einspruch Norman G.;Watts R. K.
Publisher： Elsevier Science
Publication year： 2014
E-ISBN: 9781483217826
P-ISBN(Paperback): 9780122341168
Subject： TN47 large scale integrated circuit (VLSIC)
Keyword： 自动化技术、计算机技术
Language： ENG
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Description
VLSI Electronics Microstructure Science, Volume 16: Lithography for VLSI treats special topics from each branch of lithography, and also contains general discussion of some lithographic methods.
This volume contains 8 chapters that discuss the various aspects of lithography. Chapters 1 and 2 are devoted to optical lithography. Chapter 3 covers electron lithography in general, and Chapter 4 discusses electron resist exposure modeling. Chapter 5 presents the fundamentals of ion-beam lithography. Mask/wafer alignment for x-ray proximity printing and for optical lithography is tackled in Chapter 6. Chapters 7 and 8 on metrology deal with the characterization of lithography by measurements of various types.
Engineers, scientists, and technical managers in the semiconductor industry, and engineering and applied physics faculty and graduate students will find the text very useful.