The role of the Ti and Mo barrier layer in Ti/Al metallization to AlGaN/GaN heterostructures at identical process conditions: a structural and chemical characterization

Author: Chandran Narendraraj   Kolakieva Lilyana   Kakanakov Roumen   Polychroniadis E K  

Publisher: IOP Publishing

E-ISSN: 1361-6641|30|11|115011-115018

ISSN: 0268-1242

Source: Semiconductor Science and Technology, Vol.30, Iss.11, 2015-11, pp. : 115011-115018

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