Effect of Thermal Annealing on La₂O₃ Films Grown by Plasma Enhanced Atomic Layer Deposition

E-ISSN： 1662-8985|2015|1088|107-111

ISSN： 1022-6680

Source： Advanced Materials Research, Vol.2015, Iss.1088, 2015-03, pp. : 107-111

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Promotion Effects of La₂O₃ on Ni/Al₂O₃ Catalysts for CO₂ Methanation

Advanced Materials Research, Vol. 2015, Iss. 1118, 2015-08 ,pp. : 205-210

Trans Tech Publications

Access to resources Recommend Favorite

The Effect of Substrate on TiO₂ Thin Films Deposited by Atomic Layer Deposition (ALD)

Advanced Materials Research, Vol. 2015, Iss. 1087, 2015-03 ,pp. : 147-151

Trans Tech Publications

Access to resources Recommend Favorite

Effect of Na₂SO₄-V₂O₅ Mixture on Y₂O₃ Stabilized ZrO₂ Thermal Barrier Coatings Exposed at High Temperature

Advanced Materials Research, Vol. 2015, Iss. 1101, 2015-05 ,pp. : 423-427

Trans Tech Publications

Access to resources Recommend Favorite

Effect of Sc, Y, Yb, Hf, Ce on Mechanical and Thermal Properties of La₂Zr₂O₇: First-Principles Calculations

Advanced Materials Research, Vol. 2015, Iss. 1120, 2015-08 ,pp. : 85-93

Trans Tech Publications

Access to resources Recommend Favorite

Growth of TiO₂ Thin Films by Atomic Layer Deposition (ALD)

Advanced Materials Research, Vol. 2016, Iss. 1133, 2016-02 ,pp. : 352-356

Trans Tech Publications

Access to resources Recommend Favorite