Initial Growth Mechanism of Atomic Layer Deposited Hafnium Dioxide Using Cyclopentadienyl-Type Precursor: A Density Functional Theory Study

Publisher： Trans Tech Publications

E-ISSN： 1662-8985|2015|1120|16-20

ISSN： 1022-6680

Source： Advanced Materials Research, Vol.2015, Iss.1120, 2015-08, pp. : 16-20

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