Electrical and Physical Property of TiO₂ Films Prepared at Different Deposition Time

E-ISSN： 1662-8985|2015|1109|524-528

ISSN： 1022-6680

Source： Advanced Materials Research, Vol.2015, Iss.1109, 2015-07, pp. : 524-528

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Photoelectrochemical Properties of Anatase TiO₂ Films Prepared by Improved Liquid Phase Deposition

Advanced Materials Research, Vol. 2015, Iss. 1120, 2015-08 ,pp. : 419-423

Trans Tech Publications

Access to resources Recommend Favorite

TiO₂ Nanoparticles Thin Film Prepared by Electrostatic Spray Deposition Technique for Humidity-Sensing Device

Advanced Materials Research, Vol. 2015, Iss. 1131, 2016-01 ,pp. : 153-156

Trans Tech Publications

Access to resources Recommend Favorite

Synthesis and Characterization of Nb-Doped TiO₂ Thin Films Prepared by RF Magnetron Sputtering

Advanced Materials Research, Vol. 2015, Iss. 1117, 2015-08 ,pp. : 139-142

Trans Tech Publications

Access to resources Recommend Favorite

The Effect of Substrate on TiO₂ Thin Films Deposited by Atomic Layer Deposition (ALD)

Advanced Materials Research, Vol. 2015, Iss. 1087, 2015-03 ,pp. : 147-151

Trans Tech Publications

Access to resources Recommend Favorite

Growth of TiO₂ Thin Films by Atomic Layer Deposition (ALD)

Advanced Materials Research, Vol. 2016, Iss. 1133, 2016-02 ,pp. : 352-356

Trans Tech Publications

Access to resources Recommend Favorite