MOS Interface Characteristics of In Situ Ge-Doped 4H-SiC Homoepitaxial Layers

Publisher: Trans Tech Publications

E-ISSN: 1662-9752|2015|821|512-515

ISSN: 0255-5476

Source: Materials Science Forum, Vol.2015, Iss.821, 2015-07, pp. : 512-515

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Abstract