Langmuir探针对以SiCl4/H2低温沉积多晶硅薄膜过程的在线检测

Publisher: 国家哲学社会科学学术期刊数据库

E-ISSN: 1674-1102|29|6|33-35

ISSN: 1674-1102

Source: 池州学院学报, Vol.29, Iss.6, 2015-01, pp. : 33-35

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Abstract