Cover Picture: Monolithic, Crystalline MOF Coating: An Excellent Patterning and Photoresist Material (ChemNanoMat 5/2015)

Publisher： John Wiley & Sons Inc

E-ISSN： 2199-692x|1|5|286-286

ISSN： 2199-692x

Source： CHEMNANOMAT, Vol.1, Iss.5, 2015-09, pp. : 286-286

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