Atomic Layer Deposition (ALD): Fundamentals, Characteristics and Industrial Applications ( Chemical Engineering Methods and Technology )

Publication series :Chemical Engineering Methods and Technology

Author: Jeannie Valdez  

Publisher: Nova Science Publishers, Inc.‎

Publication year: 2015

E-ISBN: 9781634839204

P-ISBN(Hardback):  9781634838696

Subject: L No classification

Keyword: Chemical Engineering

Language: ENG

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Atomic Layer Deposition (ALD): Fundamentals, Characteristics and Industrial Applications

The users who browse this book also browse


No browse record.