Effect of N doping on hole density of Cu₂O:N films prepared by the reactive magnetron sputtering method

Author： Li B.B. Lin L. Shen H.L. Boafo F.E. Chen Z.F. Liu B. Zhang R.

E-ISSN： 1286-0050|58|2|20303-20303

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.58, Iss.2, 2012-05, pp. : 20303-20303

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

AlN thin films deposited by DC reactive magnetron sputtering: effect of oxygen on film growth

By García Molleja Javier Gómez Bernardo José Ferrón Julio Gautron Eric Bürgi Juan Abdallah Bassam Djouadi Mohamed Abdou Feugeas Jorge Jouan Pierre-Yves

EPJ Applied Physics (The), Vol. 64, Iss. 2, 2013-11 ,pp. : 20302-20302

Edp Sciences

Access to resources Recommend Favorite

Structural and optical properties of copper nitride thin films in a reactive Ar/N₂ magnetron sputtering system

By Dorranian D. Dejam L. Sari A. H. Hojabri A.

EPJ Applied Physics (The), Vol. 50, Iss. 2, 2010-05 ,pp. : 20503-20503

Edp Sciences

Access to resources Recommend Favorite

Structural and Morphological Characteristics of In_xga_1-xN Films Grown on SI (111) by Reactive Magnetron Sputtering

MATEC Web of conference, Vol. 67, Iss. issue, 2016-07 ,pp. : 04013-04013

Edp Sciences

Access to resources Recommend Favorite

Annealing dependence on flexible p-CuGaO₂/n-ZnO heterojunction diode deposited by RF sputtering method

By Lam Mui Li

EPJ Web of Conference, Vol. 162, Iss. issue, 2017-11 ,pp. : 01061-01061

Edp Sciences

Access to resources Recommend Favorite

Luminescence from thulium and samarium doped amorphous AlN thin films deposited by RF magnetron sputtering and the effect of thermal activation on luminescence

By Maqbool M.

EPJ Applied Physics (The), Vol. 34, Iss. 1, 2006-03 ,pp. : 31-34

Edp Sciences

Access to resources Recommend Favorite