Optical Emission Analysis of a Si(CH3 )4 -Argon Radio Frequency Plasma for SiC Films Deposition
Publisher: Edp Sciences
E-ISSN: 1764-7177|05|C5|C5-607-C5-614
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.05, Iss.C5, 1995-06, pp. : C5-607-C5-614
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