Publisher: Edp Sciences
E-ISSN: 1764-7177|05|C5|C5-567-C5-582
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.05, Iss.C5, 1995-06, pp. : C5-567-C5-582
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
REMOTE PLASMA CHEMICAL VAPOUR DEPOSITION OF SILICON NITRIDE FILMS
Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. :
Remote plasma metalorganic chemical vapor deposition of GaN epilayers
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
Remote plasma chemical vapour deposition of silicon nitride films
Journal de Physique III, Vol. 2, Iss. 8, 1992-08 ,pp. :
Study of the precursor injection in a remote microwave PECVD reactor
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :