Publisher： Edp Sciences
E-ISSN： 1764-7177|02|C2|C2-295-C2-302
ISSN： 1155-4339
Source： Le Journal de Physique IV, Vol.02, Iss.C2, 1991-09, pp. : C2-295-C2-302
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Photo-MOCVD of Cu thin films using Cu(hfa)(MHY) as precursor
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
Access to resources
Recommend
Deposition and characterization of CVD – MoO
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
YBa
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :
Direct liquid injection MOCVD growth of TiO
Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. :