LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF TIN OXIDE THIN FILMS FROM AN ORGANOMETALLIC COMPOUND. APPLICATION TO GAS DETECTION

Publisher： Edp Sciences

E-ISSN： 1764-7177|02|C2|C2-303-C2-310

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.02, Iss.C2, 1991-09, pp. : C2-303-C2-310

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

HIGH Tc SUPERCONDUCTING THIN FILMS BY ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION

By  

Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. : C5-117-C5-117

Edp Sciences

Access to resources Recommend Favorite

Synthesis of pyrite (FeS2) thin films by low pressure metal-organic chemical vapor deposition

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-613-Pr8-620

Edp Sciences

Access to resources Recommend Favorite

Atmospheric pressure chemical vapour deposition of tin sulfide thin films

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-403-Pr8-410

Edp Sciences

Access to resources Recommend Favorite

Chemical vapor deposition of tin oxide from SnEt4

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-651-Pr8-657

Edp Sciences

Access to resources Recommend Favorite

Cobalt oxide thin films prepared by metalorganic chemical vapor deposition from cobalt acetylacetonate

By  

Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. : Pr3-637-Pr3-643

Edp Sciences

Access to resources Recommend Favorite