Publisher: Edp Sciences
E-ISSN: 1764-7177|09|PR8|Pr8-763-Pr8-768
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.09, Iss.PR8, 1999-09, pp. : Pr8-763-Pr8-768
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Laser-Induced Chemical Vapour Deposition of Silicon Carbonitride
Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. :
LOW-TEMPERATURE CHEMICAL-VAPOR-DEPOSITION OF SILICON NITRIDE
Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. :
CHEMICAL VAPOR DEPOSITION OF COPPER FOR MICROELECTRONIC DEVICESBASED ON SILICON
Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. :