Computational analysis of horizontal cold wall CVD reactors at low pressure : Application to tungsten deposition from pyrolysis of W(CO)6

Publisher： Edp Sciences

E-ISSN： 1764-7177|11|PR3|Pr3-183-Pr3-188

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.11, Iss.PR3, 2001-08, pp. : Pr3-183-Pr3-188

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Low Pressure CVD of Tungsten Carbides

By  

Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. : C5-967-C5-974

Edp Sciences

Access to resources Recommend Favorite

Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-395-Pr8-402

Edp Sciences

Access to resources Recommend Favorite

MODELING OF COLD WALL CHEMICAL VAPOR DEPOSITION REACTORS (FOR SEMICONDUCTOR FABRICATION)

By  

Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. : C5-57-C5-65

Edp Sciences

Access to resources Recommend Favorite

INFLUENCE OF THE FILAMENT MATERIAL ON LOW-PRESSURE HOT-FILAMENT CVD DIAMOND DEPOSITION

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-923-C2-930

Edp Sciences

Access to resources Recommend Favorite

Low Pressure CVD of Silicon Nitride from a Silane-Ammonia Mixture : Analysis of Preliminary Experimental and Simulation Results

By  

Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. : C5-291-C5-298

Edp Sciences

Access to resources Recommend Favorite