Study of the low frequency noise from 77 K to 300 K in NbN semiconductor thin films deposited on silicon

Publisher： Edp Sciences

E-ISSN： 1764-7177|12|3|175-178

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.12, Iss.3, 2002-05, pp. : 175-178

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