Publisher: Edp Sciences
E-ISSN: 1764-7177|12|4|9-8
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.12, Iss.4, 2002-06, pp. : 9-8
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
In-situ process monitoring of MOCVD of superconducting and dielectric oxide thin films
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
On the reflection, transmission and absorption factors of thin metallic films.
Journal de Physique et le Radium, Vol. 10, Iss. 4, 1949-04 ,pp. :
Apparatus for the study of the photoelectric sensitivity of thin metallic films.
Journal de Physique et le Radium, Vol. 23, Iss. 8-9, 1962-08 ,pp. :
Rapid preparation method of thin films of metallic halides
Journal de Physique Appliqué, Vol. 19, Iss. S7, 1958-07 ,pp. :