Influence of the properties of the initiating plasma on the formation of thin films of copper oxide by reactive cathode sputtering.

Publisher： Edp Sciences

E-ISSN： 0302-0738|25|12|993-998

ISSN： 0302-0738

Source： Journal de Physique, Vol.25, Iss.12, 1964-12, pp. : 993-998

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Kinetic properties of TiN thin films prepared by reactive magnetron sputtering

By Solovan M.   Brus V.   Maryanchuk P.   Kovalyuk T.   Rappich J.   Gluba M.  

Physics of the Solid State, Vol. 55, Iss. 11, 2013-11 ,pp. : 2234-2238

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

COPPER AND COPPER OXIDE THIN FILMS OBTAINED BY METALORGANIC MICROWAVE PLASMA CVD

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-389-C2-395

Edp Sciences

Access to resources Recommend Favorite

Study of electrical properties of thin films of platinum obtained by cathode sputtering in simple gases

By  

Journal de Physique et le Radium, Vol. 4, Iss. 6, 1933-06 ,pp. : 301-315

Edp Sciences

Access to resources Recommend Favorite

Structural and transport properties of cubic spinel ZnCo 2 O 4 thin films grown by reactive magnetron sputtering

By Kim H.J.   Song I.C.   Sim J.H.   Kim H.   Kim D.   Ihm Y.E.   Choo W.K.  

Solid State Communications, Vol. 129, Iss. 10, 2004-03 ,pp. : 627-630

Elsevier

Access to resources Recommend Favorite

Structures and properties of Y-ZrO2 thin films deposited by reactive r.f. sputtering

By  

Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. : C3-611-C3-615

Edp Sciences

Access to resources Recommend Favorite