Microstructure effect on the HNO3-HF etching of LPCVD boron-doped polycrystalline silicon

Publisher： Edp Sciences

E-ISSN： 0035-1687|22|7|671-676

ISSN： 0035-1687

Source： Revue de Physique Appliquée (Paris), Vol.22, Iss.7, 1987-07, pp. : 671-676

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