A mass spectrometric diagnostic of C2F6 and CHF 3 plasmas during etching of SiO2 and Si

Publisher： Edp Sciences

E-ISSN： 0035-1687|20|8|609-620

ISSN： 0035-1687

Source： Revue de Physique Appliquée (Paris), Vol.20, Iss.8, 1985-08, pp. : 609-620

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