On the charge-handling capacity of epitaxial and ion-implanted GaAs buried channel charge-coupled devices

Publisher: Edp Sciences

E-ISSN: 0035-1687|21|6|349-356

ISSN: 0035-1687

Source: Revue de Physique Appliquée (Paris), Vol.21, Iss.6, 1986-06, pp. : 349-356

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