ANNEALING AND HYDROGENATION BEHAVIOUR OF EVAPORATED AND SPUTTERED HIGH-PURITY AMORPHOUS SILICON FILMS

E-ISSN： 0449-1947|42|C4|C4-811-C4-814

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.42, Iss.C4, 1981-10, pp. : C4-811-C4-814

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