R.F. MAGNETRON SPUTTERING OF a-Si : H

Publisher： Edp Sciences

E-ISSN： 0449-1947|42|C4|C4-659-C4-662

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.42, Iss.C4, 1981-10, pp. : C4-659-C4-662

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Microstructure AFM study and raman spectra of In-GaAs bilayers prepared by R.F. magnetron sputtering on Si(100) substrates

By  

Journal of Physics: Conference Series , Vol. 480, Iss. 1, 2014-04 ,pp. : 80-83

IOP Publishing

Access to resources Recommend Favorite

VIBRATIONAL EXCITATIONS IN a-Si : F AND a-Si : F : H ALLOYS

By  

Le Journal de Physique Colloques, Vol. 42, Iss. C6, 1981-12 ,pp. : C6-93-C6-95

Edp Sciences

Access to resources Recommend Favorite

Physical and tribological properties of a-Si1-xCx : H coatings prepared by r.f. plama-assisted chemical vapour deposition

By  

Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. : C3-503-C3-510

Edp Sciences

Access to resources Recommend Favorite

Structural, optical and electrical properties of V doped ZnO thin films deposited by r.f. magnetron sputtering

By  

Journal of Physics: Conference Series , Vol. 253, Iss. 1, 2010-11 ,pp. : 243-248

IOP Publishing

Access to resources Recommend Favorite

Influences of deposition parameters on microstructure and dielectric properties of BST thin film deposited by R.F. magnetron sputtering

By  

Journal of Physics: Conference Series , Vol. 152, Iss. 1, 2009-03 ,pp. : 197-200

IOP Publishing

Access to resources Recommend Favorite