

Publisher: Edp Sciences
E-ISSN: 0449-1947|41|C8|C8-745-C8-748
ISSN: 0449-1947
Source: Le Journal de Physique Colloques, Vol.41, Iss.C8, 1980-08, pp. : C8-745-C8-748
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content


INVESTIGATION OF Ti-Cu, Zr-Cu, Hf-Cu ALLOYS AFTER LOW TEMPERATURE ION IMPLANTATION
Le Journal de Physique Colloques, Vol. 41, Iss. C8, 1980-08 ,pp. :








ELECTRONIC PROPERTIES OF AMORPHOUS Cu
Le Journal de Physique Colloques, Vol. 41, Iss. C8, 1980-08 ,pp. :