FIELD INDUCED ADSORPTION AT AN AMORPHOUS SILICON SURFACE STUDIED BY FIELD ION MICROSCOPY

Publisher： Edp Sciences

E-ISSN： 0449-1947|49|C6|C6-203-C6-208

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.49, Iss.C6, 1988-11, pp. : C6-203-C6-208

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Field ion and scanning tunnel microscopy studies of surface and bulk defects in carbon and silicon

By Suvorov A.   Cheblukov Yu.   Lazarev N.   Bobkov A.   Popov M.   Babaev V.  

Technical Physics, Vol. 45, Iss. 3, 2000-03 ,pp. : 343-348

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

VACUUM METAL CONDENSATION STUDIED BY FIELD EMISSION MICROSCOPY

By  

Le Journal de Physique Colloques, Vol. 49, Iss. C6, 1988-11 ,pp. : C6-145-C6-150

Edp Sciences

Access to resources Recommend Favorite

RESOLUTION OF FIELD-ION MICROSCOPY VERSUS SCANNING TUNNELLING MICROSCOPY FOR OBTAINING SURFACE CHARGE DENSITY CORRUGATIONS

By  

Le Journal de Physique Colloques, Vol. 45, Iss. C9, 1984-12 ,pp. : C9-119-C9-124

Edp Sciences

Access to resources Recommend Favorite

NEGATIVE ION IMAGING IN FIELD ION MICROSCOPY

By  

Le Journal de Physique Colloques, Vol. 47, Iss. C7, 1986-11 ,pp. : C7-53-C7-57

Edp Sciences

Access to resources Recommend Favorite

Field-ion microscopy of deformation effects near the surface in ion-implanted metals (Ir)

By Ivchenko B.   Syutkin N.  

Technical Physics Letters, Vol. 25, Iss. 3, 1999-03 ,pp. : 233-234

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite